| 摘要 |
PURPOSE:To obtain a resist material having high sensitivity to ionizing radiation, such as X-rays, gamma-rays, or electron beams, by using a polymer made from a specified trioxabicyclo compd. as a structural unit, and having a specified weight average mol.wt. CONSTITUTION:A trioxabicyclo compd. represented by the general formula show here where R is alkyl is high in sensitivity to ionizing radiation, and a copolymer of this unit and acrylonitrile unit or the like unit rises in sensitivity as compared with the starting material of acrylonitrile. Since the rise of sensitivity means that a necessary amt. of exposure is small, it can shorten exposure time. Sensitivity to ionizing radiation, such as electron beams and X-rays, rises as its mol.wt. increases, and when it has a mol.wt. of <=1,000, its sensitivity becomes insufficient, and when >=1 million, resolution is lowered by swelling occurring during development, and further, problems occur also in respects of solubility and coating performance. Therefor, preferable mol.wt. of the copolymer is 1- 1,000 thousand, and the best resist material can be obtained, above all when the polymer has a weight average mol.wt. of 10-1,000 thousand. |
