| 摘要 |
PURPOSE:To prevent the corrosion phenomenon of an element pattern by eliminating a plated base before an etching process in the pattern forming process of a magnetic head. CONSTITUTION:A plated base between an element pattern 15 and patterns 21 and 22 is eliminated by the ion milling method. The exposed part of a substrate 13 is masked with a resist 23 to cover the plated base 20 between the element pattern 15 and the substrate 13 with the resist 23. When dummy patterns 21 and 22 are eliminated by etching, the plated base 20 under these patterns is slightly etched but is left. The plated base 20 around the lower part of the element pattern 15 is not etched. Next, masking of the resist 23 is eliminated, and the left plated base 20 is eliminated by the ion milling method to terminate the forming process of the element pattern 15. Thus, the element pattern 15 which is not etched is formed on the substrate 13. |
