| 摘要 |
PURPOSE:To form the interface between the core and the clad of a light guide very smoothly by improving the manufacturing process by utilizing the difference of selective etchability between Si and SiO2. CONSTITUTION:A groove for a light guide is formed on a substrate 10 of Si and heat oxidized, the produced heat oxidized film is removed from the substrate 10, and then, an Si oxidized film 14 is formed on the substrate 10 as the first clad member. A core member 15 made of a mixture of SiO2 and Ti higher in refractive index than the film 14 is formed on the clad member 14, and the surface of this core member 15 is coated with a resist, and the surfae of the first clad member 14 is disclosed by dry etching. Then, an Si oxidized film 17 is formed as the second clad member 17 to obtain a light guide. |
