PHOTORESIST DEVELOPING SOLUTION

摘要

PURPOSE:To obtain a developing soln. capable of easily giving a resist film having a prescribed pattern by mixing specified aqueous developer solns. so as to minimize a change in developing speed in a prescribed service temp. range and to make a temp. regulating operation unnecessary. CONSTITUTION:An aqueous soln. prepd. by mixing an aqueous soln. of tetramethylammonium hydroxide (TMAH) with an aqueous soln. of trimethyl-(hydroxyethyl)ammoniumhydroquinone (THAH) in 5:2-1:10 weight ratio is used as a photoresist developing soln. A change in the developing speed of the developing soln. in the service temp. range is minimized by making use of the developing speeds of the developer solns. depending on temp., and a temp. regulating operation is made unnecessary. A resist film having a prescribed pattern can be easily obtd. with the developing soln.