发明名称 SOLUTION FOR HOLDING ACTIVITY OF ELECTROLESS PLATED COPPER FILM
摘要 PURPOSE:To obtain the titled soln. retardind the rusting of an electroless-plated copper film by properly adjusting the pH of an aqueous soln. contg. adequate amounts of formaldehyde and a cupric ion complexing agent and by regulating the concn. of dissolved oxygen in the soln. to a prescribed value or less. CONSTITUTION:The pH of an aqueous soln. contg. >=4g/l (para)formaldehyde and >=5g/l N,N,N',N'-tetrakis-2-(2-hydroxypropyl)ethylenediamine or cyclohexane- 1,2-diamine-N,N,N',N'-tetraacetic acid as a cupric ion complexing agent is adjusted to >=11 with an aqueous soln. of NaOH or KOH, and the concn. of dissolved oxygen in the soln. is regulated to >=3ppm by blowing gaseous nitrogen or by other method to obtain a soln. for holding the activity of an electroless- plated copper film. When a printed wiring board subjected to through hole electroless copper plating is immersed in the soln., the oxidation of the electroless- plated copper film is inhibited, and the film can be held active until copper electroplating is carried out.
申请公布号 JPS59219458(A) 申请公布日期 1984.12.10
申请号 JP19830093565 申请日期 1983.05.27
申请人 NIPPON DENKI KK 发明人 SATOU TAKAO;MITSUI SHINICHI
分类号 C23C18/40;H05K3/18;(IPC1-7):C23C3/02 主分类号 C23C18/40
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