| 摘要 |
PURPOSE:To enhance photosensitivity and alkali resistance by using a compsn. composed essentially of a photosensitive resin having photosensitive groups to be made reactive by irradiation of actinic rays in the molecule and a specified chemical structure, and a specified sensitizer system. CONSTITUTION:(A) A photosensitive resin having photosensitive groups to be made reactive by irradiation of actinic rays and a chemical structure represented by the formul shown here; and (B) a sensitizer system capable of causing said (A) to react by irradiation of actinic rays are used as essential components. When a halide compd. capable of generating halogen radicals on irradiation of actinic rays is contained in the sensitizer system of a photosensitive resin compsn. having such a constitution, the generated halogen radicals abstracts H to produce an acid and form color, resulting in hardening at the same time as exposure and forming color. When the photosensitive resin compsn. contains a sensitizer system having no halogen compd., it forms color by acid treatment after hardening on exposure. Said photosensitive resin compsn. is composed essentially of (A) and (B), but in addition, it may be properly mixed with a solvent, a diluent, etc. |
