发明名称 CLEANING FLUID CONTAINING CORROSION INHIBITOR USED IN SEMICONDUCTOR PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a environmentally friendly cleaning fluid, capable of preventing corrosion of metal, and simultaneously capable of reducing an etching amount of a polysilicone. SOLUTION: This cleaning fluid contains a corrosion inhibitor of chemical formula 1 (one of R<SB>1</SB>and R<SB>4</SB>is hydroxy and the other is an alkyl, an alkoxy, amino, nitro, mercapto, hydroxy, aldehyde, carboxyl, H or a halogen; and R<SB>2</SB>and R<SB>3</SB>are each a 0-10C straight-chain or branched-chain hydrocarbon residue) and a surfactant of chemical formula 2 [R<SB>5</SB>is methyl; A is HO(CH<SB>2</SB>CH<SB>2</SB>O)<SB>L</SB>(CH(CH<SB>3</SB>O)CH<SB>2</SB>O)<SB>M</SB>- (L and M are each an integer of 0 to 15) or hydroxy; and K is an integer of 3 to 22]. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004359937(A) 申请公布日期 2004.12.24
申请号 JP20040111218 申请日期 2004.04.05
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 MUN CHANG-SUP;SANG-JUN CHOI;HAN WOO-SUNG;HONG CHANGKI
分类号 C11D3/00;C11D3/02;C11D3/16;C11D3/20;C11D11/00;C23G1/06;C23G1/18;H01L21/304;(IPC1-7):C11D3/20 主分类号 C11D3/00
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