发明名称 Composite sacrificial material
摘要 A composite sacrificial material is deposited in a void or opening in a dielectric layer on a semiconductor substrate. The composite sacrificial material includes a polymeric or oligomeric matrix with filler material mixed therein. The filler material may be particulate matter that may be used to modify one or more properties of the composite sacrificial material during semiconductor processing.
申请公布号 US6858528(B2) 申请公布日期 2005.02.22
申请号 US20030393063 申请日期 2003.03.20
申请人 INTEL CORPORATION 发明人 MEAGLEY ROBERT P.;GOODNER MICHAEL D.
分类号 H01L21/31;H01L21/311;H01L21/469;H01L21/4763;H01L21/768;H01L23/48;H01L29/02;H01L47/00;(IPC1-7):H01L21/476 主分类号 H01L21/31
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