| 摘要 |
<p>The method of reactive ion etching molybdenum or molybdenum silicide include the steps of placing a sample (4) to be etched on one of two opposed electrodes (2, 3) in a vacuum chamber (1), charging an etching gas into the chamber, applying high frequency electrical power to the electrodes to generate a discharge between them, and etching the exposed portion of the sample. The gas is a mixture of chlorine and oxygen, with the oxygen flow rate being less than about 30% of the total flow rate of the mixture.</p> |
