Method for photochemical conversion of silicon monoxide to silicon dioxide.

摘要

SiO can be photochemically converted to SiO2 by irradiation with ultraviolet light of wavelengths less than 220 nm in an atmosphere including oxygen. The irradiation can be pulsed or continuous radiation, and energy fluences of at least about 5mJ/cm<2> will effect the photochemical reaction. The conversion of SiO to SiO2 can be used to provide an etch-stop in a fabrication process and to provide improved devices and circuits, in technologies such as Josephson and semiconductor device technologies.