发明名称 Defect detecting apparatus and method
摘要 An apparatus and method for detecting defects in a substrate, including the periphery of the substrate, by the use of an image pickup device which sequentially scans the substrate along each of a plurality of vertically displaced horizontal lines for equal horizontal scanning periods. The analog output of the pickup device is coded to provide a binary coded signal having a polarity determined by the amount of light reflected from the substrate at each incremental portion of the scanning periods. The binary coded signal is shifted for a first interval which is less than the horizontal scanning period to obtain a first shifted output, and then further shifted for a second interval, measured from the end of the first interval, which is equal to the horizontal scanning period to obtain a second shifted output. The polarities of the first and second shifted outputs are compared in a comparator, the presence of a defect in the substrate being indicated when the first and second shifted outputs have predetermined opposite polarities at a given instant of time followed by a reversal in the polarities of each of the first and second shifted outputs.
申请公布号 US4486777(A) 申请公布日期 1984.12.04
申请号 US19820432408 申请日期 1982.09.30
申请人 FUJI ELECTRIC COMPANY, LTD. 发明人 YAMAMURA, TATSUO
分类号 G01N21/85;G01N21/88;G01N21/94;(IPC1-7):H04N7/18 主分类号 G01N21/85
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