发明名称 METHOD FOR PLASMA TREATMENT
摘要 PURPOSE:To form a rough surface, improve the adhesive property, deepen the color of dyed materials and improve the feeling and gloss of dyed materials, by etching a high polymeric sheetlike material continuously with a low-temperature plasma generated between specific asymmetric electrodes. CONSTITUTION:A high polymeric sheetlike material 1 is treated with a low- temperature plasma generated between internal electrodes in which the total suface area of electrodes 3 on the high voltage side is 0.1-2.5 times of the total surface area of an electrode 2 on the grounded side in an asymmetric electrode having one electrode of the electrodes 3 on the high voltage side with the total surface area of (1/500)-(1/10) of the total surface area of the electrode 2 on the grounded side. Preferably, the gas in discharging the above-mentioned low-temperatue plasma is oxygen or a mixed gas containing the oxygen, and the vacuum degree (p) is 0.05-1.0Torr with 1-10cm distance (d) between the electrodes 3 and 2 on the high voltage side and grounded side in the following relation: 0.05<p.d.<5 (TorrXcm).
申请公布号 JPS59213735(A) 申请公布日期 1984.12.03
申请号 JP19830088293 申请日期 1983.05.18
申请人 KURARAY KK 发明人 AKAGI TAKAO;YAMAGUCHI SHINJI;KOYAMA MOTOYASU
分类号 C08J7/00;B29C59/14;H01L21/302;H01L21/3065;(IPC1-7):C08J7/10 主分类号 C08J7/00
代理机构 代理人
主权项
地址