| 摘要 |
In a method of measuring moisture permeation through a surface protective film a specimen is prepared which comprises a substrate (1) which is impermeable to water and is transparent to infra-red rays; a water-absorbent layer (2) formed on the substrate, the water-absorbent layer being composed of a material which exhibits an infra-red absorption spectrum which varies depending upon the absorption of moisture; and a covering of the surface protective film (3) formed on the water-absorbent layer so that the layer is completely covered by the protective film and the substrate. The prepared specimen is then exposed to steam at a temperature of about 120-1000 DEG C under a pressure of about 2 to 20 atmospheres to accelerate the moisture absorption. The steam-exposed specimen is then subjected to infra-red spectrophotometry, whereby the moisture permeation through the surface protective film (3) is determined. The method can be advantageously utilised for judging water resistance of semiconductor devices, each of which has a surface protective film formed thereon. |
