发明名称 |
PHOTOSENSITIVE BODY |
摘要 |
PURPOSE:To permit a thin film to retain high potential by forming a photosensitive body composed of an a(amorphous)-SiN type surface-modified layer and an a-Si type photoconductive layer and an a-SiC type electrostatic charge transfer layer. CONSTITUTION:A charge transfer layer 2 made of a-SiC hydride or fluoride contg. 10-30atomic% C is formed on a substrate 1. On this layer 2, a photoconductive layer 3 made of a-Si hydride or fluoride is formed. Further on this layer 3, a surface-modified layer 4 made of a-SiN hydride or fluoride is formed. It is desirable to form a charge blocking layer made of a-SiC hydride or fluoride doped with an element of group VA of the periodic table between the layer 2 and the substrate 1. |
申请公布号 |
JPS59212841(A) |
申请公布日期 |
1984.12.01 |
申请号 |
JP19830086892 |
申请日期 |
1983.05.18 |
申请人 |
KONISHIROKU SHASHIN KOGYO KK |
发明人 |
YAMAZAKI TOSHIKI;NAKANISHI TATSUO;NOMORI HIROYUKI |
分类号 |
G03G5/08;(IPC1-7):G03G5/08;G03G5/04;G03G5/14 |
主分类号 |
G03G5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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