发明名称 PHOTOSENSITIVE HEAT RESISTANT MATERIAL
摘要 PURPOSE:To obtain a microworkable and heat resistant material by reacting an unsatd. deriv. with amino groups produced by additionally reacting an unsatd. aziridine compd. with carboxylic groups of a polyamide acid and mixing the product with a bisazide compd. CONSTITUTION:An aziridine compd. having an unsatd. group represented by general formula ( I ) (R3 is a group having an unsatd. bond) is reacted with carboxylic acid groups linked to the side chains of a polyamide acid obtained by reacting diamine with tetracarboxylic dianhydride to produce a new amino group. An unsatd. deriv. represented by the general formula: R4-COX (R4 is a group having an unsatd. bond, and X is -OH, glycidyl, or isocyanate) is reacted with this resultant amine to obtain a polyimide precursor having an unsatd. bond. A substrate is coated with a mixture of said precursor and a bisazide compd. as a photo-crosslinking agent, imagewise exposed and developed to obtain a relief, and further it is heat-treated at 200-400 deg.C.
申请公布号 JPS59212834(A) 申请公布日期 1984.12.01
申请号 JP19830087880 申请日期 1983.05.17
申请人 MITSUBISHI DENKI KK 发明人 KUBOTA SHIGERU;MORIWAKI NORIMOTO;ANDOU TORAHIKO;ETOU SHIYOUHEI
分类号 C08F2/00;C08F2/48;C08F290/00;C08F299/00;C08F299/02;C08G73/00;C08G73/10;C08G73/12;C08L79/08;G03F7/037;G03F7/038;H01L21/027;H01L21/312;(IPC1-7):G03C1/71;H01L21/30;G03F7/10 主分类号 C08F2/00
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