发明名称 HIGH SPEED SPUTTERING TARGET OF FERROMAGNETIC MATERIAL
摘要 PURPOSE:To prevent impurities from mixing into thin films and extend the life of a target and reduce the defective products by a method wherein thin layers of the same ferromagnetic material as the target are formed at the bottoms of the gaps provided to the target. CONSTITUTION:A ferromagnetic target 2, which has gaps 3 of less than 3mm. width, is provided to the surface of a backing plate 1. A magnetic field of a magnetic field generator 4, provided to the back of the backing plate 1, is leaked on the surface of the target 2 through the gaps 3 in order to improve the plasma density to sputter ferromagnetic material. Thin layers 5 of the same ferromagnetic material as the target 2 are formed at the bottoms of the gaps 3. With these layers 5, the backing plate 1 is not sputtered by ions rushing into the gap 3 and mixing of the backing plate materials such as Cu into the thin films as impurities is avoided so that the target 2 can be used until the surface of the backing plate 1 is exposed by errosion. Therefore the life of the target 2 can be extended.
申请公布号 JPS59211211(A) 申请公布日期 1984.11.30
申请号 JP19830085140 申请日期 1983.05.17
申请人 NIPPON SHINKU GIJUTSU KK 发明人 NAKAMURA KIYUUZOU;OOTA YOSHIFUMI;YAMADA HIROKI
分类号 C23C14/36;C23C14/35;H01F41/18 主分类号 C23C14/36
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