DEVELOPING DEVICE FOR RESIST OF SEMICONDUCTOR SUBSTRATE

摘要

PURPOSE:To improve development effect by vibrating a spin chuck vertically which attracts and holds a semiconductor substrate horizontally so as to stir the developing solution sufficiently. CONSTITUTION:A rotary shaft 4 of a spin chuck 3 is supported by a bearing 6 and an eccentric cam 1 is fitted to a rotary shaft 1c which is arranged under said bearing 6. A spring shoe 2 is fitted to the lower end of the rotary shaft 4 and a compression coil spring 5 is interposed between said spring shoe 2 and the bearing 6. Rotation of the eccentric cam 1 causes the spin chuck 3 to move up and down and the vertical vibration is transmitted to a semiconductor substrate (wafer) 7. Then, a waving phenomenon occurs in the horizontal developing solution 8 on the semiconductor substrate (wafers) 7 and the solution is stirred.