发明名称 |
HEAT RESISTANT AND RADIATION SENSITIVE COMPOSITION AND RESIST |
摘要 |
PURPOSE:To provide heat resistance and superior sensitivity to radiation to a radiation sensitive composition by using specified chlorinated poly-2-isopropenylnaphthalene. CONSTITUTION:This radiation ensitive composition contains chlorinated poly- 2-isopropenylnaphthalene prepd. by introducing chlorine into naphthalene rings in poly-2-isopropenylnaphthalene having >=40 deg. of polymn. at 0.2-5mol average degree of substitution of chlorine per 1mol constituent monomer. |
申请公布号 |
JPS59211038(A) |
申请公布日期 |
1984.11.29 |
申请号 |
JP19830085595 |
申请日期 |
1983.05.16 |
申请人 |
KUREHA KAGAKU KOGYO KK |
发明人 |
DOI HIDEAKI;FUJII YASUFUMI;KOKUBU KENICHI;SAKAGAMI TERUO |
分类号 |
C08F8/00;C08F8/20;C08F12/00;G03F7/038 |
主分类号 |
C08F8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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