发明名称 HEAT RESISTANT AND RADIATION SENSITIVE COMPOSITION AND RESIST
摘要 PURPOSE:To provide heat resistance and superior sensitivity to radiation to a radiation sensitive composition by using specified chlorinated poly-2-isopropenylnaphthalene. CONSTITUTION:This radiation ensitive composition contains chlorinated poly- 2-isopropenylnaphthalene prepd. by introducing chlorine into naphthalene rings in poly-2-isopropenylnaphthalene having >=40 deg. of polymn. at 0.2-5mol average degree of substitution of chlorine per 1mol constituent monomer.
申请公布号 JPS59211038(A) 申请公布日期 1984.11.29
申请号 JP19830085595 申请日期 1983.05.16
申请人 KUREHA KAGAKU KOGYO KK 发明人 DOI HIDEAKI;FUJII YASUFUMI;KOKUBU KENICHI;SAKAGAMI TERUO
分类号 C08F8/00;C08F8/20;C08F12/00;G03F7/038 主分类号 C08F8/00
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