| 摘要 |
<p>PURPOSE:To improve the yield in the production of a color filter by exposing a negative type photosensitive resin from the rear of a base plate with red and blue filter mosaics as a mask and forming the pattern of a blue filter mosaic. CONSTITUTION:A color mosaic 13 of the 2nd color is formed and a negative type photosensitive film 14 to be dyed is formed on a base plate 10 coated theron with a transparent intermediate layer 12 having resistance to dyeing, in forming the 3rd color, blue color, mosaic. When the film 14 is exposed 15 from the rear of the plate 10 and is developed, the pattern of said film is selectively formed. The photosensitive film to be dyed in this state is absorbed of light by the 1st and 2nd dyed color mosaics 11, 13 and the photosensitive film to be dyed on the mosaics 11, 13 are unexposed and are removed by the development. The 3rd color is dyed on the film to be dyed formed by the exposure on the rear side to form the color mosaic of the 3rd color. The entire surface is coated with a transparent protective film.</p> |
