Liquid phase epitaxy apparatus.

摘要

A sliding boat liquid phase epitaxy apparatus comprising a base 1, substrate support means 2 superposed on the base 1, and a well member 5 abutting and disposed above the substrate support means 2 and having at least one well 22 capable of containing growth solution 28. The substrate support means 2 comprise a recessed substrate holder 16 which can be disposed under and in registration with the well 22. The well member 5 and the substrate support means 2 are relatively slidable in the length direction of the apparatus. A problem encountered in growing layers of material by a liquid phase epitaxy process using a sliding boat apparatus is to achieve adequate wipe-off of growth solution in order to provide a grown layer having a smooth surface. The bottom of the well members is provided with a plurality of grooves 23 on the side of the/each well which traverses or is traversed by the recessed substrate holder 16 after growth of an epitaxial layer, and wherein the grooves 23 extend across at least a width of the well member 5 which is greater than and includes the width of the substrate holder recess 16.