| 发明名称 |
Immersiefotolithografie met megasonische spoeling. |
| 摘要 |
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while immersed in a liquid, and developing the photoresist. |
| 申请公布号 |
NL1030480(C2) |
申请公布日期 |
2008.04.25 |
| 申请号 |
NL20051030480 |
申请日期 |
2005.11.21 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHING-YU CHANG |
| 分类号 |
G03F7/16;G03F7/20;H01L21/00 |
主分类号 |
G03F7/16 |
| 代理机构 |
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代理人 |
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| 地址 |
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