发明名称 TITANIUM EVAPORATION TYPE VACUUM APPARATUS FOR PLASMA
摘要 PURPOSE:To minimize the radiation loss of formed plasma, by arranging a shield member between a titanium vapor generating part and the inner wall of a vacuum container. CONSTITUTION:A shield member 4 is arranged between the leading end 3a of a titanium evaporation apparatus 3 and a space for generating plasma P. The titanium vapor generated from the leading end 3a of the titanium evaporation apparatus 3 is adhered to the surface of the shield member 4 in the side of the titanium evaporation apparatus 3 and a part of the inner wall surface of a vacuum container 1 not contacted with plasma P and the vacuum container 1 is evacuated to a high vacuum degree by the adsorbing action of the adhered titanium. At this time, because titanium adhered to the shield member 4 and a part of the inner wall of the container 1 is not contacted with plasma P, no mutual action is generated and the mixing of titanium in plasma P is minimized to minimize the radiation loss of the formed plasma P.
申请公布号 JPS59209638(A) 申请公布日期 1984.11.28
申请号 JP19830084323 申请日期 1983.05.12
申请人 MITSUBISHI DENKI KK 发明人 YAMAGUCHI SAKUTAROU
分类号 C23F4/00;B01J3/00;C23C14/24;C23C14/34 主分类号 C23F4/00
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