| 摘要 |
PURPOSE:To improve the throughput of forming a pattern by previously registering an ultrafine reference pattern to be repeatedly drawn in an ROM. CONSTITUTION:Only an ultrafine pattern is previously extracted from an integrated circuit pattern, the ultrafine pattern is divided into one or more reference patterns 41 according to a regularity, registered in an ROM17, and a position (x, y) from a drawing reference point of the reference pattern, numbers p, m of chips of directions x, y, pitches c, a, the numbers g, n of the reference patterns when a plurality of reference patterns are disposed in the chips, pitches d, b are inputted as data for specifying the position to be formed with the patterns 41. The data may be inputted, for example, by an operator through a console 14 by a keyboard to a CPU13. In case of drawing, an electron beam is moved to the reference point of (x0, y0) by the movement of the stage 1, the deflection of the electron beam or their combination, and the data are drawn on the basis of the reference pattern data registered in the ROM17 with the reference point as an origin. Then, similar operation is repeated to enable to draw over the entire surface of a wafer. |
