| 摘要 |
PURPOSE:To provide a large-sized sputtering target capable of forming accurately at a high speed with an amorphous vertically magnetized membrane of the prescribed composition. CONSTITUTION:A sputtering target 10 is formed of a base phase 11 made of rare earth metals such as gadolinium, terbium, dysprosium, holmium, and a buried phase 12 made of transition metal such as cobalt, iron. The base phase 11 is planely contacted with the cathode of a magnetron sputtering device, and the phase 12 is disposed at the free surface side opposite to the cathode. According to the sputtering target of such structure, the target can be manufactured merely by engaging a burying phase made of the transition metal in the base phase made of the rare earth metal. The metals of respective phases have no brittleness and good workability. Accordingly, an extremely large size can be readily manufactured. |
