发明名称 PRODUCTION PROCESS OF SEMICONDUCTOR DEVICE
摘要 Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.
申请公布号 JPS59208547(A) 申请公布日期 1984.11.26
申请号 JP19840085206 申请日期 1984.04.28
申请人 AMERIKAN TEREFUON ANDO TEREGURAFU CO 发明人 EDOUIN AASAA CHIYANDOROSU;ERUSA REIHIMANISU;KURETASU UORUTAA UIRUKINSU JIYUNIYA
分类号 C08K5/00;C07F7/18;C07J51/00;C08K5/32;C08L33/00;C08L33/02;G03C1/72;G03C5/08;G03F7/004;G03F7/039;G03F7/20;H01L21/027 主分类号 C08K5/00
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