| 摘要 |
PURPOSE:To eliminate graininess to make a titled screen bright, and to execute easily focusing by converting a reticle pattern to a large area by a step and repeat method, forming a mask, and recording this mask pattern as a smooth uneven part on a photosensitive material. CONSTITUTION:A reticle pattern constituted by scattering a figure semiregularly is repeated by a step and repeat method and obtains a large area to produce a mask and subsequently, the pattern of this mask is recorded as a smooth uneven part on a photosensitive material. When the reticle pattern is expanded by this step and repeat method, the reticle pattern formed in advance is used so that a joint does not exist by the superposition of a constituted figure, an unnatural gap, etc. in any boundary part to the adjacent reticle pattern. Also, the reticle patter is constituted so that a density distribution of vertical and horizontal unit widths formed by the constituted graphic becomes constant, and also, since the pattern and the photosensitive material are separated a little from each other and an exposure is executed, a smooth uneven surface is obtained. |
