发明名称 METAL CIRCUIT STRUCTURE
摘要 A structure comprising on a substrate successive layers of metal circuitry having therebetween as a dielectric a cured polyimide composition containing a polyimide and aluminum oxide or zinc oxide or mixtures thereof. The structure is produced by a method including the following process steps: - blanket screen printing a mixture containing a polyamido carboxylic acid, aluminum oxide or zinc oxide or mixtures thereof and a detackifier with the rest being a solvent on a substrate with a layer of metal circuitry thereon, - drying the deposited layer at a temperature between about 25 and 120 DEG C, - selectively etching holes into the deposited layer where vias between adjacent layers of metal circuitry are needed, - curing the deposited layer at a temperature between about 300 and 400 DEG C and - forming another layer of metal circuitry.
申请公布号 JPS59204295(A) 申请公布日期 1984.11.19
申请号 JP19840001446 申请日期 1984.01.10
申请人 INTERN BUSINESS MACHINES CORP 发明人 PIITAA BAKOSU;RATSUSERU ERUUTSUDO DAAROU;NERUSON PIITAA FURANCHIYAKU;JIYOSEFU FUYUNARI
分类号 H05K3/46;H01L23/498;H05K1/00;H05K1/03 主分类号 H05K3/46
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