发明名称 SHADOW MASK STRUCTURE
摘要 PURPOSE:To prevent the generation of color shift by holding a skirt section formed integratedly at the periphery section of a rectangular shadow mask at the eight fixed points on horizontal, vertical, and diagonal axes, in a rectangular mask frame with higher coefficient of thermal expansion than that of the mask. CONSTITUTION:Rectangular electron beam permeation holes 21a with their major sides in the direction of vertical axis Y are perforated regularly in a rectangular shadow mask made of low thermal expansion material such as amber material and a skirt section 22 is formed integratedly in the periphery section of the mask 21. The skirt section 22 is held in a rectangular mask frame 23 made of high thermal expansion material such as pure iron on each of the vertical axis Y, horizontal axis X, and diagonal axis P and Q through fixed points 24. In addition, a shadow mask support body is secured to the side of the frame 23 and a shadow mask frame body is mounted on a panel pin through this support body. As a result, the shadow mask without color shift, screen vibration owing to voices, and the electron beam travel owing to a fall can be obtained.
申请公布号 JPS59203349(A) 申请公布日期 1984.11.17
申请号 JP19830077623 申请日期 1983.05.04
申请人 TOSHIBA KK 发明人 GOUSHI SEIJI;OKUMURA KIYOSHI
分类号 H01J29/07;(IPC1-7):H01J29/07 主分类号 H01J29/07
代理机构 代理人
主权项
地址