| 摘要 |
PURPOSE:To improve the adhesion between an upper layer resist and lower layer resist and heat resistance by compounding a specific amt. of a tack imparting agent with the resist in the laminate of the film photoresist consisting of the upper layer resist and the lower layer resist. CONSTITUTION:A laminate is formed of an upper layer resist and a lower layer resist. The lower layer resist is formed of a compsn. consisting essentially of the cyclized matter of a butadiene polymer. The upper layer resist is formed of the compsn. contg. 100pts.wt. a polymer or copolymer of a mono-olefin unsatd. compd., 5-100pts.wt. a multifunctional photopolymerizable unsatd. compd. having photopolymerizable double bonds in the molecule, a photocrosslinking agent, a photosensitizing agent, a photopolymn. initiator, etc. A track imparting agent is compounded with the upper layer resist and lower layer resist of the laminate of the photoresist constituted in such a way at a rate of 0.1-50pts.wt. in 100pts.wt. the polymer or copolymer of the cyclized matter of the butadiene polymer or the polymer of the mono-olefin unsatd. compd. |
