发明名称 TARGET FOR SPUTTERING
摘要 PURPOSE:To provide a titled target which enables efficient production of a photomagnetic recording medium by embedding flaky bodies having paramagnetism in the prescribed positions of a base body which has ferromagnetism in the stage of a sputtering state. CONSTITUTION:Cylindrical flaky bodies 6 of about 5mm. diam. consisting of a rare earth element such as Gd, Tb, Dy or the like having paramagnetism in the stage of a sputtering state are embedded in the adequate positions of a plate-shaped body 5 having ferromagnetism in the stage of a sputtering state, thereby constituting a target for sputtering. The embedment of the bodies 6 into the body 5 is accomplished simply by forming preliminarily prescribed holes in the body 5 and fitting the bodies 6 into the holes. The high-speed mass production of a recording medium for magnetooptic recording element consisting particularly of the rare earth and transition metal alloy is made possible with good reproducibility by using such target.
申请公布号 JPS59200762(A) 申请公布日期 1984.11.14
申请号 JP19830075929 申请日期 1983.04.26
申请人 SHARP KK 发明人 TAKAHASHI AKIRA;HIROKANE JIYUNJI;KATAYAMA HIROYUKI;OOTA KENJI;YAMAOKA HIDEYOSHI
分类号 C23C14/36;C23C14/34;C23C14/35;H01J37/34 主分类号 C23C14/36
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