| 摘要 |
PURPOSE:To provide a vapor deposition device which is capable of forming a film deposited by evaporation with good quality by installing an electric discharging means for ionizing and/or activating the gas for reaction to be supplied into a vapor deposition vessel via an attaching member which is adjustable in position with respect to the wall part of the vapor deposition vessel. CONSTITUTION:The inside of a bell-jar (vapor deposition vessel) 30 is preliminarily evacuated to, for example, 10<-5>-10<-7> Torr. A substrate 2 disposed in the bell-jar 30 is heated 34 to <=600 deg.C, more particularly <=300 deg.C and while the activated and/or ionized gas for reaction is introduced 36 into the bell-jar 30, an evaporating material is evaporated by heating from an evaporating source 25 disposed to face the substrate 2, thereby forming a film on the substrate 2. A gas discharger 37 is installed in the bell-jar 30 via an attaching plate 39 which is adjustable in position with respect to the wall part of the bell-jar 30. More specifically, the formation of the uniform film on a large area is made possible by providing at least one gas discharger adjustable in position in the vapor deposition vessel. |
