| 发明名称 | Laser beam controlling device and extreme ultraviolet light generating apparatus | ||
| 摘要 | A laser beam controlling device may include: a guide laser device; a guide laser beam wavefront adjuster provided in a beam path of the guide laser beam outputted from the guide laser device; a beam combiner configured to adjust travel directions of a laser beam outputted from a laser system and the guide laser beam outputted from the guide laser beam wavefront adjuster to coincide with each other, a both beam wavefront adjuster provided in a beam path of both the laser beam and the guide laser beam outputted from the beam combiner, a beam monitor provided in a beam path of both the laser beam and the guide laser beam outputted from the both beam wavefront adjuster, and a controller configured to control the guide laser beam wavefront adjuster and the both beam wavefront adjuster based on detection results at the beam monitor with respect to both the laser beam and the guide laser beam. | ||
| 申请公布号 | US9386675(B2) | 申请公布日期 | 2016.07.05 |
| 申请号 | US201514724636 | 申请日期 | 2015.05.28 |
| 申请人 | GIGAPHOTON INC. | 发明人 | Suzuki Toru;Wakabayashi Osamu |
| 分类号 | H05G2/00;G02B27/14;G02B27/00;H01S3/00;G02B17/08;H01S3/23;G02B27/10 | 主分类号 | H05G2/00 |
| 代理机构 | Studebaker & Brackett PC | 代理人 | Studebaker & Brackett PC |
| 主权项 | 1. A laser beam controlling device, comprising: a guide laser device configured to output a guide laser beam; a guide laser beam wavefront adjuster provided in a beam path of the guide laser beam outputted from the guide laser device; a beam combiner configured to adjust a travel direction of a laser beam outputted from a laser system and a travel direction of the guide laser beam outputted from the guide laser beam wavefront adjuster to coincide with each other; a both beam wavefront adjuster provided in a beam path of both the laser beam outputted from the beam combiner and the guide laser beam outputted from the beam combiner; a beam monitor provided in a beam path of both the laser beam outputted from the both beam wavefront adjuster and the guide laser beam outputted from the both beam wavefront adjuster; and a controller configured to control the guide laser beam wavefront adjuster and the both beam wavefront adjuster based on detection results at the beam monitor with respect to both the laser beam outputted from the both beam wavefront adjuster and the guide laser beam outputted from the both beam wavefront adjuster. | ||
| 地址 | Tochigi JP | ||