| 摘要 |
PURPOSE:To evaluate the electric characteristic of a specific element in an IC to be produced by providing a evaluating pattern, for example, for an element forming mask other than masks for wiring forming also. CONSTITUTION:Patterns 7-1-7-N for evaluation which facilitate measurement of various production parameters are provided in specific positions of chip matrixes in individual masks 8-1-8-N in all processes. These patterns 7-1-7-N for evaluation are always inserted to fixed positions in masks of all kinds of IC to be produced. Thus, patterns in fixed positions are measured and analyzed automatically by a certain method independently of kinds of produced ICs, and the electric characteristic of a specific element in the IC to be produced is evaluated. |
