发明名称 RADIATION-SENSITIVE IMAGE FORMING MATERIAL AND IMAGE FORMING METHOD
摘要 PURPOSE:To obtain an image forming metod having a high resolving power and high sensitivity by using a polymer contg. a specific repetitive unit. CONSTITUTION:An image forming material is formed by using a high polymer having the repetitive unit expressed by the general formula ( I ), i.e., poly(2- butyn), poly(2-pentene), poly(2-hexine), etc. or >=2 kinds of copolymers selected from these monomers. After said material is coated on a base plate, an image is irradiated thereto by using far UV light, X-rays, electron rays, etc. and the material is developed with an org. solvent. Solvents, such as, for example, acetone, methyl ethyl ketone, methyl-n-propyl ketone, etc., expressed by the general formula (II) are used for the developing solvent.
申请公布号 JPS59198447(A) 申请公布日期 1984.11.10
申请号 JP19830072125 申请日期 1983.04.26
申请人 HIGASHIMURA TOSHINOBU 发明人 HIGASHIMURA TOSHINOBU;MASUDA TOSHIO;YAMAOKA HITOSHI;MATSUYAMA TOMOFUMI
分类号 G03F7/26;G03F1/00;G03F1/68;G03F1/80;G03F7/038;G03F7/039;G03F7/32;H01L21/027 主分类号 G03F7/26
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