| 摘要 |
PURPOSE:To obtain a recording medium substrate adapted to facilitate the release from a matrix by a method wherein after a replica work, a transparent substrate is placed on the matrix coated with a mold release agent and a light hardening resin and then, light irradiates to harden the light hardening resin. CONSTITUTION:After a replica work, a silicon-or fluorine-based mold release agent 5 is applied on a matrix facing a replica surface in the area to be removed. Then, a specified amount of a light hardening resin 4 is applied on the matrix, a transparent substrate such as acrylic substrate 3 is placed on the light hardening resin 4 and then, light such as ultra-violet rays irradiate to harden the light hardening resin 4 grasped with the matrix and the transparent substrate. Thereafter, the light hardening resin 4, namely, a replica is released from the matrix together with the transparent substrate and then, a finishing is done to obtain a desired recording medium substrate.
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