| 摘要 |
PURPOSE:To easily align a photo mask by forming a positioning transparent frame section along with a guard band on the inner surface of a panel using the photomask for forming the guard band on which the first frame pattern is provided and positioning the second frame pattern provided at the photomask for forming a phosphor in the transparent frame section. CONSTITUTION:First frame patterns 26 to 29 are provided on a photomask 18 for forming a guard band in addition to patterns 20 to 25 for forming the guard band. When a guard band 30 is formed on the inner surface of a panel 19 using this photomask 18, positioning transparent frame sections 31 to 34 are formed by the frame patterns 26 to 29 simultaneously. Second frame patterns 43 to 46 are provided on photomasks 35 to 38 for forming red, green, blue, and index phosphors in addition to patterns 39 to 42 for forming the respective phosphors. When the phosphors are exposed, the photomask can easily be aligned by separately positioning the second frame patterns 43 to 46 of the photomasks 35 to 38 at the transparent frame sections 31 to 34. |
