发明名称 METHOD AND DEVICE FOR WASHING MASK FOR SEMICONDUCTOR ELEMENT MANUFACTURE
摘要 PURPOSE:To securely remove dust, etc. attaching to both sides of a mask by releasing it from an electrostatic attraction state due to mechanical peeling with a rotary brush and an electrolytic soln. CONSTITUTION:A mask 14 is passed through a gap between shower pipes 21, 21' and further, through a gap between rotary brushes 22, 22' made of nylon to wet both sides of the mask 14 with pure water or aq. <=1% ammonia in a washing vessel 20 and to scrub them. An electrolytic soln. flows out from shower pipes 31, 31' in a washing vessel 30, and the mask 13 is passed between these pipes 31, 31' to remove static electricity accumulated during the brush washing and the use of the mask 13. In a washing vessel 40, the mask 12 to be washed is passed through shower pipes 41, 41' and immersed in an isopropanol vessel 42, and again passed through the pipes 41, 41' for spraying isopropanol to substitute an org. liquid for an aq. soln. The mask 11 to be washed fed to a washing vessel 50 is brought into contact with freon 51 vapor, cleaned with the vapor, and rapidly dried while passing near a cooler 53.
申请公布号 JPS59195646(A) 申请公布日期 1984.11.06
申请号 JP19830070495 申请日期 1983.04.21
申请人 NIPPON DENKI KK 发明人 WADA TOSHIO;YAMASHITA HIROMI
分类号 B08B3/04;B08B11/00;G03F1/00;G03F1/82;H01L21/00;H01L21/304 主分类号 B08B3/04
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