| 摘要 |
PURPOSE:To utilize far ultraviolet rays obtd. by a pulse discharge tube as a source of photon necessary for the surface photochemical deposition by combining a chemical reaction vessel with a discharge tube apparatus through a device for inhibiting intrusion of gaseous molecules in the chemical reaction vessle into a light radiation discharge tube. CONSTITUTION:A chemical reaction vessel 15 is constructed so as to be able to perform a photochemical reaction by housing a base plate 24 for carrying out a surface chemical reaction in the inside of the vessel. Further, photon flux having a luminance with high energy capable of giving directivity to the photochemical reaction in the vessel 15 is generated by a discharge lamp comprising annular discharge circuits 1, 2, an electromagnetic induction exciting apparatus 3 for exciting the pulse magnetic flux for said discharge circuits, and an apparauts 8 for supplying light emitting discharge gas. The vessel 15 is further combined with the discharge lamp through an apparat us for inhibiting intrusion of gaseous molecules in the vessel 15 into the discharge lamp apparatus. The far ultraviolet rays obtd. by this way in the pulse discharge tube is utilized for the photon source for the surface photochemical deposition or etching reaction. |
