| 摘要 |
<p>PURPOSE:To obtain uniform color filter film by providing coating films of a high polymer compd. soluble in an org. solvent or a photosensitive material on a base plate or color filter, subjecting the films to a plasma treatment, forming a coating film of a water soluble photosensitive material thereon and patterning and dyeing said material. CONSTITUTION:Protective films 3-5 are provided by using a high polymer compd. soluble in an org. solvent or photosensitive material, for example, polyglycidyl methacrylate (PGMA), etc. on a base plate 1 or a color filter film 6 to be provided thereon and are then subjected to a plasma treatment. A coating film of a water soluble photosensitive material is thereafter provided thereon and is patterned and dyed. The protective films 2-4 are obtd. and the color filter films 6-8 are obtd. By repeating successively the above-mentioned operation. A protective film 5 is disposed on the uppermost layer. After the film 5 is formed in such a way, the film is subjected to a plasma treatment, by which the coating characteristic of the filter film is improved. The residual film rate is improved by adding a small amt. of water to a developing agent for the PGMA. The uniform and satisfactory color filter for a solid state image pickup element, etc. is thus obtd.</p> |
