发明名称 METHOD OF PRODUCING A SOLID STATE PHOTOELECTRIC DEVICE
摘要 A photoelectric device having at least a predetermined impurity region which is disposed in a semiconductor substrate, and a photoelectric conversion portion which is constructed by stacking an electrode layer lying in contact with at least a part of the impurity region, a photoconductive material layer overlying the electrode layer, and a transparent electrode overlying the photoconductive material layer, characterized in that the photoconductive material layer is made of an amorphous chalcogenide material which principally contains Se, is disclosed. It is very favorable that the photoelectric conversion material layer made of the amorphous material principally containing Se is partially doped with Te so as to enhance its sensitivity. The amorphous chalcogenide material is very useful in the following point. In the course of forming, or after having formed, at least one photoconductive layer on a semiconductor body whose surface is uneven, a heat treatment is performed at a temperature of at least the softening point of the photoconductor so as to flatten the layer, whereby discontinuous parts of the photoconductor ascribable to the uneven surface of the semiconductor body can be avoided.
申请公布号 DE3069268(D1) 申请公布日期 1984.10.31
申请号 DE19803069268 申请日期 1980.06.06
申请人 HITACHI, LTD. 发明人 TSUKADA, TOSHIHISA;TAKASAKI, YUKIO;HIRAI, TADAAKI;BAJI, TORU;YAMAMOTO, HIDEAKI;TANAKA, YASUO;MARUYAMA, EIICHI;ISHIOKA, SACHIO
分类号 H01L27/146;(IPC1-7):H01L27/14 主分类号 H01L27/146
代理机构 代理人
主权项
地址