发明名称 MASK BLANK WITH PELLICLE
摘要 PURPOSE:To prevent the sticking of dust to a blank surface and to rationalize the manufacturing process by mounting and unifying a pellicle on the upper surface of a mask blank to form a light interrupting film and a resist film on a substrate surface. CONSTITUTION:On the surface of a glass substrate 21, a light interrupting film 22, a reflecting film 23 and a resist film 24 are formed, made into the mask blank 25 and the pellicle 26 to stretch the transparent protective film 28 of about 0.7mum thick at the edge surface of a cylinder 27 with the height of about 5mm made of aluminum is bonded on a blank 25. Consequently, immediately after the mask blank 25 is formed, the pellicle 26 is mounted, and therefore, the sticking of the dust on the mask blank surface is prevented, the blank with the pellicle is exposed as it is and the manufacturing process can be rationalized.
申请公布号 JPS6231855(A) 申请公布日期 1987.02.10
申请号 JP19850171433 申请日期 1985.08.02
申请人 FUJITSU LTD 发明人 TAKAHASHI TAKAO
分类号 G03F1/00;G03F1/50;G03F1/62;H01L21/027 主分类号 G03F1/00
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