| 摘要 |
PURPOSE:In a method for forming solid electrolytic thin film onto titanium disulfide or positive pole material for a lithium cell through spattering, to form the solid electrolytic film without oxidizing the substrate. CONSTITUTION:When forming 0.6Li4SiO4.0.4Li3PO4 electrolytic film onto TiS2 thin film on a silicon substrate through spattering, the temperature of substrate is controlled to -20-150 deg.C while low output spattering is performed at the initial stage of spattering to prevent oxidation of TiS2 and to form solid electrolytic thin film. Since TiS2 has high ion conductivity and electron conductivity, if solid electrolytic thin film can be formed on it, thin film solid cell or ECD element can be produced. |
