| 摘要 |
PURPOSE:To prevent attachment of foreign matters to a mask with a cover and to correct light path loss and color aberration with a quartz plate by forming a quartz cover on a mask and arranging a quartz plate same in thickness as said quartz cover. CONSTITUTION:A mask 14 is obtained by forming a light nontransmitting film 30 of Cr or the like in a prescribed pattern on a substrate 29 of a quartz glass or the like, and a cover 31 is formed on the surface side. The cover 31 is composed of a spacer 32 on the periphery of the mask 14 and a quartz plate 33 to keep the surface of the mask 14 airtight. A wafer support 16 has a holder 35 for holding the wafer 16 having a photoresist 34, and around the holder 35 a spacer 36 is formed to hold a quartz plate 37. The plate 37 is formed in a thickness same as that of the plate 33, and an interval l2 between this and the surface of the wafer 16 is the same as the interface l1 between the plate 33 and the film 30. |
