| 摘要 |
PURPOSE:To form a glass film pattern having high precision without requiring etching process, by covering a prebaked glass paste of a photoresist and glass powder with photomask, irradiating it with ultraviolet rays, exposing, developing, rinsing, drying, and calcining it. CONSTITUTION:For example, the gold film 5 is formed on the whole face of the alumina substrate 4 by meltallizing, printing, etc., the glass paste 6 consisting of a mixture of a positive-type photoresist and glass powder is applied to the film 5 and prebaked. The paste 6 is covered with photomask, irradiated with ultraviolet rays, and exposed. The paste 6 is developed, and the photoresist and the glass powder are partially removed. The developed paste 6 is rinsed, dried, and calcined, to form a pattern of glass film.
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