发明名称 CHEMICAL ETCHING SOLUTION FOR CRYSTAL OF III-V GROUP COMPOUND
摘要 PURPOSE:To provide the titled etching soln. contg. an alkali dichromate, hydrochloric acid and acetic acid, giving a mirror-finished surface, and having high reproducibility in etching depth. CONSTITUTION:This etching soln. is an aqueous soln. contg. an alkali dechromate such as potassium dichromate or sodium dichromate, hydrochloric acid and acetic acid. When a crystal of a III-V group compound is etched with the etching soln., the formation of etching pits can be prevented, and a mirror-finished surface can be obtd. with high reproducibility in etching depth. The shape of the cross-section of the etched crystal is independent of the crystal orientation, so the etching soln. can be used well as an etching soln. for mesa etching.
申请公布号 JPS59190366(A) 申请公布日期 1984.10.29
申请号 JP19830063630 申请日期 1983.04.13
申请人 NIPPON DENSHIN DENWA KOSHA 发明人 ADACHI SADAO;ANDOU SEIGO
分类号 C23F1/30;C23F1/00;H01L21/302;H01L21/306 主分类号 C23F1/30
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