| 摘要 |
PURPOSE:To improve the throughput and reduce the cost by dividing the drawing region of reticle mask into four segments by dividing it into two parts in vertical and horizontal respectively and by drawing the pattern through respective rotation of stage for 90 deg.. CONSTITUTION:An analog signal converted by a figure analyzing circuit 10 is applied to a blanker 4, a projection lens 5 and a deflector 6 and drawing is carried out on the reticle mask of a segment by controlling the electron beam 2. Upon completion of drawing of a segment, a computer 11 issues an instruction to a rotating motor controller 9 in order to rotate the stage 8 loading the reticle mask 7 for 90 deg.. A position detection mark 14 provided on the reticle mask 7 is scanned by the electron beam 2, a signal output from the position detection mark 14 is fetched to the computer 11 through a detector 17 and a control signal is outputted to the rotating motor controller 9 from the computer 11 so that the stage 8 rotates accurately for 90 deg.. |
