| 发明名称 |
METHOD OF APPLYING PHOTOSETTING SUBSTANCE FOR BASE MATERIAL AND EXPOSING IT |
| 摘要 |
<p>Actinic radiation exposes photohardenable material in two steps whereby photohardenable material not present as a solid is exposed through a photomask prior to application to a substrate and in a second step is reexposed through the photomask after application of the material to the substrate.</p> |
| 申请公布号 |
JPS59189341(A) |
申请公布日期 |
1984.10.26 |
| 申请号 |
JP19840057510 |
申请日期 |
1984.03.27 |
| 申请人 |
E I DU PONT DE NEMOURS & CO |
发明人 |
UIRIAMU POORU HAUSAA |
| 分类号 |
B05D3/02;B05D3/06;G03F1/00;G03F1/08;G03F7/16;G03F7/20;G03F7/26;H01L21/027;H05K3/00;H05K3/06 |
主分类号 |
B05D3/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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