| 摘要 |
PURPOSE:To provide a throughput capable of accurately transferring and sufficient in a practical use with less distortion by linearly forming an X-ray source, respectively limiting the divergence of the X-ray in its longitudinal direction and in the direction perpendicular to the longitudinal direction by band slits and solar slits and emitting the X-ray. CONSTITUTION:A solar slit 10 is formed by aligning a plurality of slit plates 10a of rectangular shape along a perpendicular direction to the slits 9a of a band slit 9 at an interval (d) in Y-axis derection, and interposed between the slit 9 and a mask substrate 1. When an X-ray is emitted through the slit 10, the intensity of the X-ray varies proportionally to the opening angles at the points on the substrate 1. Accordingly, the distribution 11 of the intensity of the X-ray of a transfer pattern is varied at a period corresponding to the interval (d). However, the intensities of the respective points can be averaged by transferring the wafers 2 while continuously moving the wafers 2 in Y-axis direction.
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