发明名称 Tungsten barrier contact
摘要 A semiconductor contact has a thin barrier layer less than 500 angstroms in thickness of a metal such as tungsten applied between an aluminum contact layer and a metal-semiconductor compound. The metal semiconductor compound forms a junction with an underlying semiconductor substrate. The thin barrier prevents a chemical reaction between the aluminum of the contact layer and the metal of the metal-semiconductor compound.
申请公布号 US4478881(A) 申请公布日期 1984.10.23
申请号 US19810334561 申请日期 1981.12.28
申请人 SOLID STATE DEVICES, INC. 发明人 BARTUR, MEIR;NICOLET, MARC
分类号 H01L29/872;H01L21/285;H01L29/45;H01L29/47;(IPC1-7):H01L21/28 主分类号 H01L29/872
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