发明名称 HIGH-VOLTAGE PHOTOVOLTAIC CELL HAVING A HETERO JUNCTION OF AMORPHOUS SEMICONDUCTOR AND AMORPHOUS SILICON
摘要 <p>A p-i-n amorphous silicon photovoltaic cell of improved conversion efficiency is obtained by incorporating, on at least either one of the p and n type sides of the cell, preferably on the side exposed to the incident light, an amorphous semiconductor which satisfies the requirement that the optical band gap, Eg.opt, be not less than about 1.85 eV, the electric conductivity be not less than about 10-8 .OMEGA.cm-1 and the p-i-n junction diffusion potential, Vd, be not less than about 1.1 volts and the requirement that the amorphous semiconductor be formed of a substance represented by the general formula, a-Si1-xCx or a-Si1-yNy.</p>
申请公布号 CA1176740(A) 申请公布日期 1984.10.23
申请号 CA19810391378 申请日期 1981.12.02
申请人 KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA 发明人 HAMAKAWA, YOSHIHIRO;TAWADA, YOSHIHISA
分类号 H01L31/075;H01L31/20;(IPC1-7):H01L31/04 主分类号 H01L31/075
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